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Vapor Growth Epitaxy

См. также в других словарях:

  • Epitaxy — refers to the method of depositing a monocrystalline film on a monocrystalline substrate. The deposited film is denoted as epitaxial film or epitaxial layer. The term epitaxy comes from a Greek root ( epi above and taxis in ordered manner ) which …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… …   Deutsch Wikipedia

  • Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… …   Wikipedia

  • Stranski-Krastanov growth — (SK growth, also Stransky Krastanov or Stranski Krastanow) is one of the three primary modes by which thin films grow epitaxially at a crystal surface or interface. Also known as layer plus island growth , the SK mode follows a two step process:… …   Wikipedia

  • Molecular beam epitaxy — A simple sketch showing the main components and rough layout and concept of the main chamber in a Molecular Beam Epitaxy system Molecular beam epitaxy (MBE) is one of several methods of depositing single crystals. It was invented in the late… …   Wikipedia

  • Molecular-beam epitaxy — (MBE), is one of several methods of depositing single crystals. It was invented in the late 1960s at Bell Telephone Laboratories by J. R. Arthur and Alfred Y. Cho.MethodMolecular beam epitaxy takes place in high vacuum or ultra high vacuum (10−8… …   Wikipedia

  • Isobutylgermane — Chembox new ImageFile = Isobutylgermane 2D skeletal.png ImageFile1 = Isobutylgermane 3D balls.png ImageFile2 = Isobutylgermane 3D vdW.png IUPACName = isobutylgermane OtherNames = Isobutylgermanium trihydride Section1 = Chembox Identifiers CASNo …   Wikipedia

  • Gallium arsenide — Gallium arsenide …   Wikipedia

  • MOCVD — Die metallorganische Gasphasenepitaxie (engl. metal organic chemical vapor phase epitaxy, MOVPE) ist eine Epitaxiemethode zum Wachstum von kristallinen Schichten. Weitere Synonyme für diese Beschichtungstechnologie sind organo metallic vapor… …   Deutsch Wikipedia

  • MOVPE — Die metallorganische Gasphasenepitaxie (engl. metal organic chemical vapor phase epitaxy, MOVPE) ist eine Epitaxiemethode zum Wachstum von kristallinen Schichten. Weitere Synonyme für diese Beschichtungstechnologie sind organo metallic vapor… …   Deutsch Wikipedia

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